| 초록 |
Abstract Recently, patterned metal arrays of various feature sizes and shapes was successfully demonstrated by using polymeric colloidal masks annealed at different temperatures. Even though process is fast and cost is cheap, the imprinting, removed forms by the colloidal crystals on the polymer film, is covered with gold-nano particles and it provides that conformal contact between the polymer film and top layer of particles, which should be flat to ensure uniform pattern transfer over a large area. We arranged beads by processing silicate beads with Oxygen plasma for changing hydrophobic state to hydrophilic state so that single layer can be multi layer. And embeded for a long time so the surface of silicon wafer can shows up. Thus, our patterning technology will be able to introduce new concepts for high performance fabricating of future nanoscale devices. For example, this technology can apply to bio-sensors, bio devices of solar cells. |
