| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
고분자 가공/복합재료 |
| 제목 |
Fabrication of controlled shapes and sizes of metal nanopatternsusing polymer based double imprint lithography methods |
| 초록 |
The various shaped gold patterns can be generated from the polydimethylsiloxane (PDMS) mold using line patterns by capillary force lithography (CFL) process which is a kind of nanoimprint methods following two-cycle method. The key advantage of double imprint lithography method is to get the nano sized isolated dot shaped patterns from micro sized line patterns. If we fabricate nano sized isolated dot shaped patterns directly, we should need pre-designed patterns in the form of a master which is generally prepared by E-beam lithography. This method doesn’t need to require high-cost and time consuming process such as E-beam lithography. The successful applications of large-area periodic patterns are nano-electronic devices, nanoelectromechanical system (NEMS) and biosensors also template is the master of nanoimprint lithography (NIL) and stamp fabrication in soft lithography. |
| 저자 |
이수경, 정진미, 정희태
|
| 소속 |
KAIST |
| 키워드 |
nano patterning; capillary force lithography (CFL)
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| E-Mail |
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