| 학회 |
한국공업화학회 |
| 학술대회 |
2014년 봄 (04/30 ~ 05/02, 제주국제컨벤션센터) |
| 권호 |
18권 1호 |
| 발표분야 |
계면활성제 및 자기회합 거동의 최근 연구 동향 |
| 제목 |
Surface modification of polyimide gate insulators for solution-processed metal oxide thin-film transistors |
| 초록 |
During the past few decades, polymeric gate insulators have been extensively studied for their potential application in low-cost and flexible electronics. A variety of polymeric gate insulators for organic thin-film transistors (TFTs) have been developed. However, polymeric gate insulators for solution-processed metal oxide TFTs have been rarely reported due to their poor thermal resistance and surface property. In this presentation, we will introduce high-temperature resistant polyimide gate insulators with excellent electrical insulating properties and their surface modification for solution-processed metal oxide TFTs. |
| 저자 |
장광석, 김윤호, 가재원, 이미혜
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| 소속 |
한국화학(연) |
| 키워드 |
폴리이미드; 표면개질; 용액공정; 박막트랜지스터
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| E-Mail |
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