| 학회 |
한국화학공학회 |
| 학술대회 |
2020년 가을 (10/14 ~ 10/16, e-컨퍼런스) |
| 권호 |
26권 1호, p.478 |
| 발표분야 |
에너지 환경 |
| 제목 |
Hot-filament chemical vapor deposition applied for the growth of pyramidal WO3 thin film and its chemical sensor application |
| 초록 |
This paper describes the controlled hot filament chemical vapor deposition (HF-CVD) process for preparing the uniform porous tungsten oxide (WO3) thin film on silicon substrate. For WO3 thin film on Si substrate, the gasification followed by heating of tungsten (W) source was performed and maintained a low substrate temperature of 300oC. The prepared WO3 thin film owned highly porous pyramidal like nanostructures and possessed reasonably high surface to volume ratio. The structural, crystalline and compositional observations confirmed that the grown WO3 film exhibited the classic monoclinic crystal structure with excellent crystal quality. The grown WO3 film was employed as electro-active electrode for the detection of diethyl amine chemical to evaluate the chemical sensing behavior. |
| 저자 |
모하마드임란, 김은비, 모드샤히르아크탈, 아민사디아, 신형식
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| 소속 |
전북대 |
| 키워드 |
에너지 |
| E-Mail |
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| 원문파일 |
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