| 학회 |
한국화학공학회 |
| 학술대회 |
2008년 봄 (04/23 ~ 04/25, 제주ICC) |
| 권호 |
14권 1호, p.1281 |
| 발표분야 |
재료 |
| 제목 |
Controllable formation of Si nano-pillar array for silicon membranes |
| 초록 |
Currently, there has been increasing interest in controllable formation of silicon membranes for the wide applications in the fabrication of micro-hotplates for local thermal isolation, bulk silicon micromachining for sensor, and the portable power fields. Although there have been attempts to fabricate the silicon membranes on p-type or n-type silicon substrate, the controllable formation of Si nano-pillar array for the silicon membranes still remains a significant challenge. In this work, we demonstrated a technology for the formation of silicon membranes on pre-defined areas which consists of Si nano-pillar array. For this work, plasma etching was used for the formation of Si nano-pillar array from Cu nano-dot mask. Cu nano-dot mask was formed by rapid thermal treatment of Cu layer deposited on Si substrate using thermal evaporation. We investigated the main process parameters to obtain Si nano-pillar array from Cu nano-dot mask. Finally, the developed technology was used to form silicon membranes on the silicon substrate for microelectromechanical systems (MEMS)-based fuel cell. |
| 저자 |
김진태, 옥치원, 최대현, 김광우, Mohammad Rizwan Khan, 임연호
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| 소속 |
전북대 |
| 키워드 |
silicon nano pillar |
| E-Mail |
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| 원문파일 |
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