| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 가을 (10/07 ~ 10/08, 대구 EXCO) |
| 권호 |
35권 2호 |
| 발표분야 |
분자전자소재 및 소자 |
| 제목 |
Surface Energy Modification by Spin Cast, Large Area Graphene Film for Block Copolymer Lithography |
| 초록 |
We demonstrate a surface energy modification method exploiting graphene film. Spin cast, atomic layer thick, large area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene. |
| 저자 |
김봉훈, 김주영, 정성준, 황진옥, 이덕현, 김상욱
|
| 소속 |
KAIST |
| 키워드 |
reduce graphene; block copolymer;
|
| E-Mail |
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