| 학회 |
한국고분자학회 |
| 학술대회 |
2014년 봄 (04/10 ~ 04/11, 대전 컨벤션센터) |
| 권호 |
39권 1호 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Direct Growth of Graphene Pattern from Cross-linkable Polymer via Chemical Structure Control |
| 초록 |
Graphene is expected to play a role as an essential building block of 2D integrated circuit due to the simple modification of its electrical properties by doping and patterning. However, in order for 2D integrated circuit to be well worked, it is necessary to find another building block as insulator and combine these two building blocks into one circuit. Here, we report that one step growth of graphene/amorphous carbon (G/AC) hetero-structures from solid source as polystyrene (PS) via UV irradiation. The chemical pattern of neat/cross-linked PS via UV irradiation on copper foil converted to the pattern of G/AC in CVD. Because the resistance of amorphous carbon is 100 times higher than that of graphene, amorphous carbon is worked as insulator. Also quantum Hall effect (QHC) is measured in the resulting G/AC lateral hetero-structure, that means the interface of G/AC is well defined and proves good quality of graphene. |
| 저자 |
박범진1, 박재성2, 전금혜1, 현승1, 김광수3, 홍병희4, 김진곤1
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| 소속 |
1포항공과대, 2한국표준과학(연), 3UNIST, 4서울대 |
| 키워드 |
graphene; pattern; polymer; solid source; chemical structure control; crosslink;
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| E-Mail |
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