화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2009년 봄 (04/09 ~ 04/10, 대전컨벤션센터)
권호 34권 1호
발표분야 고분자 구조 및 물성
제목 Nanoporous film prepared by polystyrene-block-poly(methyl methacrylate) for board-band antireflection coating
초록 In this study, three layers of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA)films with differnt fractions of PMMA are consecutively spin-coated and annealed at high temperature, followed by ozone treatment. Due to the crosslinking of PS chains by ozone treatment, we could succeed in preparations of three different PS-b-PMMA solutions. Then, all the PMMA phases in the three layeres selectively removed by UV irradiation followed by acetic acid rinsing. Because of using three different PMMA volume fractions (thus, the pore volumes), the final film showed excellent antireflective properties (with less than 1 % of the reflectivity) at the broad wavelenghts covering visible and near IR regions(450 ~1500 nm).
저자 주원철, 김진곤
소속 포항공과대
키워드 Block copolymer; Antireflection coating
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