학회 | 한국재료학회 |
학술대회 | 2017년 가을 (11/15 ~ 11/17, 경주 현대호텔) |
권호 | 23권 2호 |
발표분야 | C. 에너지 재료 분과 |
제목 | Atomic Layer Deposited SnO2 on Carbon Supported Pt for Improving the Catalyst Stability of Electrochemical Glycerol Oxidation Reaction |
초록 | Atomic layer deposition (ALD) is an emerging tool that allows atomic level control to synthesize heterogeneous catalysts or electrocatalysts. The atomic precision has been used to elucidate reaction mechanisms and catalyst structure-property relationships by creating materials with a controlled distribution of size, composition, and active site. ALD has been utilized to design catalysts with improved activity, selectivity, and stability under a variety of conditions (e.g., liquid-phase and electrochemical environments). Here, we present that a thin SnO2 coating by ALD can be used to increase the catalytic stability of commercial carbon-supported Pt catalysts (Pt/C) for electrocatalytic glycerol oxidation reaction in acidic environment. Glycerol is a valuable byproduct in the production of biodiesel and fatty acids. Recently, efforts have been devoted to developing efficient electrochemical conversion technologies to produce value-added chemicals and/or energy from biomass-derived oxygenates such as glycerol. In this work, the SnO2 overcoated Pt/C catalyst shows a lower deactivation rate than the uncoated Pt/C catalyst. The stability enhancement by ALD SnO2 coating is due to preventing the catalyst from sintering in electrochemical glycerol oxidation reaction. This work shows how the ALD technique can be used to enhance catalytic stability of conventional Pt catalysts for electrocatalytic glycerol oxidation reaction. This study also paves the way for future catalyst design having high stability in electrochemical applications such as fuel cells and electrolyzers. |
저자 | 이대원1, 김영민1, 한지수1, 한정환2, 김형주1 |
소속 | 1한국화학(연), 2서울과학기술대 |
키워드 | <P>atomic layer deposition (ALD); SnO<SUB>2</SUB> coating; electrocatalysts; glycerol oxidation; stability enhancement</P> |