| 초록 |
Thin polymer films have extensive technological applications in coatings, paints, and adhesives, and, especially, block copolymer films have intensively been studied for potential use as templates and scaffolds for nanofabrication. Recently, it was demonstrated that solvent evaporation and annealing lead to a highly ordered arrays of self-assembled microdomains with few defects over large lateral areas. In this work, the dewetting behavior of block copolymer thin films that was induced by solvent annealing was investigated. Cylinder-forming PS-b-PEO was used and, for comparison, the orientation of PEO cylinders are controlled to be both parallel and perpendicular to the film surface. Block copolymer films start to dewet below the critical film thickness by “wet” dewetting. Dewetting initially generates the hole pattern, and then island structure with further decreasing the film thickness. Dewetted structures are quantitatively examined and compared with the theoretical prediction. |
