| 초록 |
A fluorinated epoxy-oligosiloxane resin with high condensation degree was synthesized by a sol-gel reaction of organo-alkoxysilanes. The synthesized oligosiloxane resin mixed with a hardener and a catalyst was spin-coated and thermally cured to fabricate a coating film of fluorinated epoxy hybrid dielectric materials (hybrimer). The fabricated hybrimer coating film showed a lower dielectric constant compared to SiO2 film (3.9). The hybrimer coating film had small loss tangent, low leakage current density, high transmittance at the visible range and high thermal stability. Thus, the hybrimer coating film can be employed as the passivation layer in the TFT. |
