| 초록 |
The self-assembly block copolymers (BCPs) has been attracted attention due to their great potential for nanolithography. When they are used in the thin films, substrates have preferential interaction with particular polymer blocks. To induce lateral orientation of block copolymer nanostructure, neutral layer must be formed on substrates. There are several conventional methods for surface neutralization. In this work, we propose a new method for the neutral layer using specific interacion between gold and thiol. We synthesized P(S-r-(S-lipoic acid))-r-PMMA random copolymer by controlled living radical polymerization. Due to the specific interaction, the gold surface can be readily modified with random copolymers by dip-coating method. Consequently, we could neutralize substrates having various shapes as well as the flat surface. |
