| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
Controlling Size of Nanodot by Block Copolymer Lithography |
| 초록 |
Size-tunable pattern transfer strategy via block copolymer lithography is demonstrated. Self-assembly of poly(styrene-block-4-vinylpyridine) (PS-b-P4VP) block copolymer generates vertical cylinder morphology by solvent annealing. In a weakly acidic aqueous solution, P4VP block become protonated and attract the anionic metal complexes through electrostatic interaction. Through this method we can fabricate sub-nanometer level size nanoparticle array. The controlled growth of monodisperse nanoparticle arrays is shown by their catalytic use for vertical carbon nanotube (CNT) growth via plasma enhanced chemical deposition (PECVD). Since the size of the catalyst particles is the important parameter for the diameters and wall-numbers of CNTs, the highly selective growth of double-walled or triple-walled CNTs could be accomplished using monodisperse nanoparticle arrays. |
| 저자 |
차승근, 신동옥, 문형석, 김주영, 문정호, 김상욱
|
| 소속 |
한국과학기술원 |
| 키워드 |
Block copolymer; PS-b-P4VP; monodisperse nanoparticle
|
| E-Mail |
|
