| 초록 |
The solvent annealing method is one of the most effective methods for tuning the orientation and morphology of self-assembled nano-stuructures in the BCP films. In this study, we investigated the solvent effect on the orientation and morphology of polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer in thin film systems. With increasing a solvent exposure time. The morphology and orientation of nanostructures of BCP thin film, characterized by scanning probe microscope (SPM) and grazing incidence small angle X-ray scattering (GISAXS), significantly changed. Especially, the BCP thin film exhibit highly ordered nano-structures at specific solvent exposure time. |
