| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 가을 (10/10 ~ 10/11, 부경대학교) |
| 권호 |
28권 2호, p.362 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Synthesis and Characterization of Positive Type Photosensitive Polyamic ester |
| 초록 |
Colorless heat resistant photosensitive polymer are widely used as protection and insulation layer for TFT LCD devices. In this study, we present on new positive type alkali developable photosensitive polyimides based on polyamic acid ester and diazonaphthoquinone (DNQ) system. The polyamic acid ester had been prepared by condensation reaction of 1,2,3,4-cyclobutanetetracarboxylic dianhydride (CBDA) and 4,4'-oxydianiline (ODA) in N-methyl-2-pyrrolidone, followed by esterification reaction using glycidyl methacylate in the presence of triethylamine at 70 ℃. Several kinds of DNQ derivatives as a dissolution inhibitor had been synthesized from DNQ-4-sulfonyl chloride and bisphenols. The dissolution behavior of polymer containing 30 wt% of dissolution inhibitor after exposure was studied, which showed that the significant difference of dissolution rate between the exposed and unexposed area. We have also varied the degree of esterification (DOE) of the polyamic acid ester and studied the relationship of DOE and photo-patternability. Further, we will discuss on photo bleaching behavior of photo-cured polyamic acid ester.
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| 저자 |
심현보1, 최성묵1, 최길영1, 김동석2, 김경준2, 이미혜1
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| 소속 |
1한국화학(연), 2LG 화학 (주) |
| 키워드 |
positive; photosensitive; alkali developable; polyamic acid ester
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| E-Mail |
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