| 학회 | 한국재료학회 |
| 학술대회 | 2009년 봄 (05/21 ~ 05/22, 무주리조트) |
| 권호 | 15권 1호 |
| 발표분야 | 전자재료 |
| 제목 | Deposition of TiO2 by ECR-ALD for organic substrate devices |
| 초록 | The passivation layers for organic light-emitting diodes (OLED) or flexible display panels have been intensively studied because they are easily degraded by water vapor and gaseous oxygen and high deposition temperature. Also it is necessary to deposit the passivation layer at low temperature, because of low glass transition temperature of polymers. Inorganic thin films like Al2O3, SiO2 and TiO2 have been reported as a passivation layer of plastic substrate and optical devices. In this work, we explore the deposition of titanium oxide at low temperature by PEALD using electron cyclotron resonance (ECR) remote plasma that provides smooth, conformal, and pinhole-free films with a great potential as passivation layer for organic based devices. Ultra-thin titanium oxide was deposited on a polyethersulfon (PES), poly N-vinylcarbazole (PVK) and Si (001) substrates by ECR-PEALD using O2 gas as a reactant at a deposition temperature of R.T. This temperature is compatible with most thermally fragile plastic substrate. In order to investigate structural behaviors, chemical composition, density, and morphology of deposited films, we used x-ray photoelectron spectroscopy (XPS), x-ray reflectometry (XRR), atomic force microscopy (AFM), scanning electron microscope (SEM), transmission electron microscope (TEM). Also we used permatran 3/33(MOCON instrument) to measure water vapor transmission rate (WVTR) values, and investigated the passivation performance of the titanium oxide film deposited on OLED by measuring lifetime of device. |
| 저자 | 강병우, 김웅선, 문대용, 박종완 |
| 소속 | 한양대 |
| 키워드 | titanium oxide; passivation; atomic layer deposition; polymer |
