| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Study of water vapor barrier properties of silicon oxide (SiOx) coatings on PET by PECVD |
| 초록 |
The plasma polymer films were deposited from HMDSO on PET under different operating conditions at RF power of 300W. The WVTR of untreated PET was 54.56 g/m2/day, decreased to 0.47 g/m2/day after depositing SiOx coatings for 10 min. It was found that the WVTR at a HMDSO flow rate of 1.5 g/h was always lower than that of 1.0 g/h at different O2 flow rates. The WVTR showed a minimum value at 20 sccm of O2 flow both for 1.0 and 1.5 g/h of HMDSO flow. The WVTR was also changed with the variation of Ar flow rate and the lowest value observed at 4 sccm. The surface properties and chemical bond information of the coatings were characterized by contact angle measurement and FTIR spectra. Examination by AFM and SEM revealed a correlation between SiOx morphology and water vapor barrier performance. From AFM images, it was evident that the roughness of the deposited coatings increased with the increase of O2 as well as Ar flow rate and the WVTR increased with the increase of roughness. |
| 저자 |
Choudhury Moinul Haque, 김원호, 김성룡
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| 소속 |
충주대 |
| 키워드 |
Plasma enhanced chemical vapor deposition (PECVD); Silicon oxide (SiOx); Hexamethyl disiloxane (HMDSO); Polyethylene terephthalate (PET); Water vapor transmission rate (WVTR) |
| E-Mail |
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