| 초록 |
On-going demand of passivation materials for the next generation display pursue substitutes with low dielectric constant, high transmittance and thermal stability, low regain, high adhesive property, and patternability that the current silicon nitride layer cannot fulfill. In this study, we have tried in various ways. We synthesized copolymers contained POSS groups and we had a simple way to used POSS crosslinker as a patternable low k material. The polymers contained POSS groups to lower dielectric constant and to enhance thermal stability. Functional groups for negative tone patterning were also introduced into the polymers to attribute their patternability. Synthesis, dielectric constant, transmittance, and negative tone patterning of the polymers will be discussed. |
