| 초록 |
Polyimide thin films were prepared via RF plasma polymerization method with 3,3’-diaminodiphenyl sulfone (mDDS) and phthalic anhydride(PA) or pyromellitic dianhydride (PMDA). Plasma polymerizations were carried out on silicon wafer as a function of plasma power, treatment time and temperature for vaporization of monomer. Polyimide thin films were also prepared by vapor deposition of those monomers followed by thermal imidization for comparison. The polyimide thin films were characterized by SEM, AFM, a-Step, FT-IR and matrix assisted laser desorption ionization, and dielectric constant measurements were evaluated. |
