| 학회 |
한국화학공학회 |
| 학술대회 |
2014년 가을 (10/22 ~ 10/24, 대전 DCC) |
| 권호 |
20권 2호, p.1184 |
| 발표분야 |
고분자 |
| 제목 |
Omniphobic Micropatterns Containing Overhanging Structures Created by Unconventional Photolithography |
| 초록 |
Photolithography uses local crosslinking or degradation of photoresist by selective exposure of ultraviolet (UV) light. This enables the preparation of micropatterns useful for a wide range of applications including semi-conductor and LCD processing. However, photolithography only can produce two dimensional structures with vertical walls. To overcome the limitation, we have developed a modified photolithography technique which uses oxygen-inhibition phenomenon during photopolymerization. Here, we prepare microarrays of hammer-like structures which can facilitate trapping of air pockets, thereby providing omniphobic property. Head and handle parts of the structures are sequentially prepared by step-by-step applications of the unconventional photolithography using a single photomask; diameter of the handle is set to be smaller than that of head by inhibiting photopolymerization by oxygen diffusion in a controlled fashion. The array of hammer-like structures exhibits hydrophobic and oleophobic properties at the same time owing to sharp corner of the head. |
| 저자 |
김주현1, 심태섭2, 김신현1
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| 소속 |
1KAIST, 2Univ. of Pennsylvania |
| 키워드 |
Photolithography; Omniphobic; Hammer-like structures
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| E-Mail |
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| 원문파일 |
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