| 초록 |
Two immiscible polymers dissolved in a common good solvent readily form layered thin film structure just after spin-casting on Si wafer. From neutron reflectivity studies, purity of top layer spans 80 to 97%, which is dependent upon molecular weight, while that of bottom layer is almost 100%. Difference in evaporation rate of the common solvent embedded in each polymer during spin-casting would be a primary cause for this phenomenon. Furthermore interfacial width between the layers becomes narrower after annealing in vacuum at above glass transition temperature of the polymers. |
