| 학회 | 한국화학공학회 |
| 학술대회 | 2005년 가을 (10/21 ~ 10/22, 인하대학교) |
| 권호 | 11권 2호, p.2417 |
| 발표분야 | 유동층 |
| 제목 | TiO2 Film Deposition on Binary Particle Mixture using Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition in a Circulating Fluidized Bed Reactor |
| 초록 | To improve fluidization quality of fine powders (Geldart's group C) in a CFB reactor, a binary particle mixture system was studied with coarse (Geldart's group A, silica gel, 100μm) and fine powders (silica gel, 28μm). Titanium oxide films were deposited on binary particle mixture by plasma enhanced chemical vapor deposition (PECVD) in a circulating fluidized bed reactor (CFB) using titanium tetraisopropoxide (TTIP, Ti(OC3H7)4) as a source material. Plasma was created by feeding helium and oxygen mixture. TiO2 film formation by PECVD have been evaluated with various process parameters such as r.f. power, gas flow rate and treatment time. The characteristics of coatings are investigated by X-ray diffraction, SEM, FTIR spectrometer. As-deposited amorphous TiO2 thin films were treated by thermal annealing in air ambient at 400~800℃. As increasing temperature, the structure of as-deposited films is converted from a fully amorphous state to a partially anatase crystalline state, which can be confirmed by the appearance of small peaks of (1 0 1), (0 0 4) and (2 0 0) orientation in XRD analysis. |
| 저자 | 김국희1, 박성희2, 김상돈1 |
| 소속 | 1한국과학기술원, 2우석대 |
| 키워드 | PECVD; TiO2; CFB |
| 원문파일 | 초록 보기 |
