| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 가을 (10/07 ~ 10/08, 대구 EXCO) |
| 권호 |
35권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Photo-curable Siloxane Hybrid Material Fabricated by Thiol-ene Reaction of Sol-Gel Synthesized Oligosiloxanes |
| 초록 |
The thiol-ene reaction is the reaction of sulfur containing compounds with alkenes, which is increasingly applied to various research fields in polymer functionalization and macromolecular synthesis. The thiol-ene reaction results high yield of target product from starting material and has strong tolerance to many different reaction conditions and solvents. In this research, we synthesized thiol and vinyl containing oligosiloxane respectively by sol-gel condensation of oranoalkoxysilane and diphenylsilanediol. These highly condensed resins were mixed with photo-initiator. It can be photo-cured by UV (365nm) light by thiol-ene reaction. And it was patterned through photo-mask. The fabricated siloxane hybrid material has high refractive index (n=1.58 at 633nm) due to the existence of sulfur and phenyl groups, and low leakage current (2.79nA/cm2 at 1MV/cm) to be applied in optics and displays. It also has high thermal stability (5% weight loss temperature=364Co) with high transparency. |
| 저자 |
김준수, 양승철, 곽승연, 배병수
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| 소속 |
KAIST |
| 키워드 |
Hybrid material; oligosiloxane; sol-gel condensation; thiol-ene reaction; photo-curable
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| E-Mail |
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