| 초록 |
This talk reports on a new block copolymer (BCP) system containing a random-copolymerized block that can provide sub-6 nm resolution, 3σ line edge roughness of 0.89 nm, sub-1-minuite assembly time, and a high etch selectivity over 10. Calculation of the Flory-Huggins interaction parameter (χ) based on Leibler’s mean-field theory and small-angle X-ray scattering measurement data confirms the gradual tunability. While guaranteeing kinetically fast self-assembly within one minute using microwave annealing, the best pattern quality resulting from the thermodynamic suppression of line edge fluctuation was achieved with a 4VP weight fraction of 33% in the random-copolymerized block. This approach enables systematical control of deep nanoscale BCP self-assembly and will provide a practical patterning solution for diverse nanostructures and devices. |
