화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2003년 봄 (04/11 ~ 04/12, 연세대학교)
권호 28권 1호, p.368
발표분야 특별 심포지엄
제목 Synthesis and Characterization of Photosensitive Polyimides with High Degree of Planarization
초록 It has been well known that high degree of planarization is one of key properties required for TFT-LCD with good reliability. Further, transmittance, chemical resistance and photo patternability are very important properties required for this field. Therefore, we had synthesized novel colorless photosensitive polyimide oligomers based on cyclobutane-1,2,3,4-tetracarboxylic dianhydride(CBDA) from aromatic diamine and monoamine containing photosensitive group to obtain photosensitive polyimide oligomer with high degree of planarization, high transmittance, and good chemical resistance. In this study, we had also investigated effect of exposure dose, molecular weight of oligomer and concentration of developer on photosensitivity of the polyimides.

저자 최성묵;김동석;최길영;이미혜
소속 한국화학(연)
키워드 Photosensitive; Polyimides; High Degree of Planarization
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