화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO))
권호 40권 2호
발표분야 고분자합성
제목 Photo-Induced Order-to-Order phase Transition of Block Copolymer to Fabricate Dual-Pattern Substrate
초록 Nowadays, block copolymer gains great attention because of its appicability to lithography. Some researchers developed photo-induced phase transition of block copolymer such as order-to-disorder, disorder-to-order. However, nobody showed photo-induced order-to-order phase transition like cylinder to lamellae, sphere to cylinder. To make it, I used polystyrene-block-poly(2-vinyl pyridine)(PS-b-P2VP), polystyrene-block-poly(tert-butoxystyrene)(PS-b-PtBOS),2-(4-methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine as photo acid generator(PAG). When PS-b-P2VP and PS-b-PtBOS are mixed, they can not interact each other. On the other hand, PtBOS group is changed to poly(hydroxy styrene)(PHS) under UV with PAG because of photolysis. Then. P2VP and PHG can be interacted each other via hydrogen bonding. So, our group could induce order-to-order transition of block copolymer under UV such as cylinder to lamellae and sphere to cylinder.
저자 김진곤1, 최청룡2
소속 1postech, 2POSTECH
키워드 PS-b-P2VP; PS-b-PtBOS; UV
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