| 학회 |
한국고분자학회 |
| 학술대회 |
2004년 봄 (04/09 ~ 04/10, 고려대학교) |
| 권호 |
29권 1호, p.50 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Resist Pattern Collapse Using Atomic Force Microscope |
| 초록 |
The adhesion strength of micro or nano resist patterns which are generally collapsed during the water rinsing in the process of development has been measured. The Atomic Force Microscope (AFM) tip attached on the cantilever was used to collapse the resist patterns. Lateral Force Microscope (LFM) was engaged to determine the adhesion strength. A position sensitive photo-diode (PSPD) detects the lateral deflection of the cantilever caused by contacting between a tip and the patterned structure. The displacement of laser spots on PSPD owing to the cantilever torsion angle was measured and converted from the voltage unit (mV) to the force unit (nN). As the pattern width increases, the collapsing force also increases. The collapsing force of the patterns with a variety of lengths was also measured. In this presentation, the characteristics of the resist pattern collapse related to the adhesion strength using AFM will be discussed. |
| 저자 |
이해원, 김성경
|
| 소속 |
한양대 |
| 키워드 |
resist pattern collapse; adhesion strength; AFM tip
|
| E-Mail |
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