| 학회 |
한국재료학회 |
| 학술대회 |
2007년 봄 (05/10 ~ 05/11, 무주리조트) |
| 권호 |
13권 1호 |
| 발표분야 |
전자재료 |
| 제목 |
Fabrication of UV-nanoimprint stamp by using colloidal lithography |
| 초록 |
UV-nanoimprint lithography is inexpensive and simple process. Nanoimprint stamps are typically generated with e-beam lithography. However, e-beam lithography is very expensive and low throughput method. We report a low cost method for producing large area stamps containing nanopillar arrays by colloidal lithography and their use in nanoimprint lithography to generate arrays of nanohole patterns in imprint resist. Colloidal lithography is simple ,low cost and applicable to a wide variety of substrate materials. Here we briefly explain our method, 300nm polystyrene(PS) spheres were spin-coated onto deposited Si3N4 on glass substrate. PS sphere sizes were controlled via reactive ion etching with O2 gas. Nanopillars were fabricated the controlled PS as etch mask with CF4 gas. UV-nanoimprint lithography was generated nanohole pattern using fabricated nanopillar stamp. Nanohole pattern has potential applications to biochips and biosensors, photonic crystal. |
| 저자 |
김태선, 정건영, 장윤희, 김상묵, 김기석, 이경미
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| 소속 |
광주과학기술원(GIST) 신소재공학과 |
| 키워드 |
imprint lithography; colloidal lithography
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| E-Mail |
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