| 학회 |
한국고분자학회 |
| 학술대회 |
2007년 가을 (10/11 ~ 10/12, 일산킨텍스) |
| 권호 |
32권 2호 |
| 발표분야 |
분자전자 소재 및 소자 기술(분자전자 부문위원회) |
| 제목 |
Surface Relief Grating induced Soft Lithographic Patterning in Semiconducting Polymer Films for Light Harvesting of Organic Photovoltaic Devices |
| 초록 |
Recently, the efficiencies of organic solar cells have improved largely from the development of the soluble donor/acceptor pairs (polymer/fullerene). In conventional Si solar cells, standard photolithography has been used to enhance light trapping and absorption. But, the photolithographic patterning is not suitable for polymer devices because of material degradation by UV light or solvent. When azo-materials are exposed to the polarized light, azobenzene moieties were reoriented and mass-flowed by the interference pattern of polarized light. It could result optical fabrication of surface relief grating (SRG) on azo film. We demonstrate the fabrication of azopolymer SRG and poly(dimethylsiloxane) (PDMS) master, and soft lithographical micro-contact printing on the semiconducting polymer layers. We investigated the surface profiles of the patterned layers and the solar cell performances fabricated by soft contact patterning method. |
| 저자 |
홍재철, 나석인, 김주환, 김동유
|
| 소속 |
광주과학기술원 |
| 키워드 |
organic solar cell; surface relief grating
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| E-Mail |
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