| 초록 |
Silica nanosphere has been considered important material in very wide field such as catalyst, painting, pharmaceuticals, picture sensitizer. Lately, researches related to silica nanosphere are actively doing as chemical mechanical polishing materials which planarize silicon wafer surface used in transistor micro-circuit board. In this study, we investigate the effect of various reaction parameters on the particle size and distribution of silica nanosphere by Sol-Gel method. The reaction components consist of silicon alkoxide, alcohol, ammonia, and water and varies reaction factors as silicon alkoxide, alcohol, [H2O]/[Si(OR)4] ratio, ammonia concentration and reaction temperatures. |
