| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Directed Self-Assembly (DSA) for Next Generation Nanolithography |
| 초록 |
DSA of BCPs can generate thermodynamically stable, periodic nanodomains(5~50nm) within guiding templates and has been one of representing candidates for extending optical lithography beyond its current limits. This talk will demonstrate soft-graphoepitaxy, a cost-effective, truly scalable, ultralarge-area BCP lithography, to direct lateral ordering in BCP thin films. Since the organic PR prepattern is readily disposable, this approach provides laterally ordered self-assembled nanopatterns and corresponding pattern transferred functional nanostructures without any trace of the structure directing prepattern. Furthermore, the microscale PR pattern can be transformed into a sub-30-nm scale ultrafine lamellar pattern. This talk will also introduce closely stacked highly anisotropic line patterns of supramolecular BCP thin film on a faceted surface. The supramolecule morphology prepared by blending the NPs consisted of highly ordered NPs arrays over an arbitrarily large-area. |
| 저자 |
정성준1, 김상욱2, Ting Xu3, 김미정1, 김용철1, 한인택1, 고행덕1, 박연정1
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| 소속 |
1삼성종합기술원, 2KAIST 신소재공학과, 3UC Berkeley |
| 키워드 |
Directed Self Assembly; Block copolymer; Nanolithography
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| E-Mail |
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