| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관) |
| 권호 |
34권 2호 |
| 발표분야 |
방사광을 이용한 고분자 나노소재 연구 |
| 제목 |
Transition Behavior of Weakly Interacting Block Copolymer in Film Geometry |
| 초록 |
The order-to-disorder transition (ODT) for the films of a symmetric polystyrene-b-poly(methyl methacryltate) (PS-b-PMMA) on a modified surface in a weak segregation regime, was investigated by in-situ grazing incidence small angle x-ray scattering (GISAXS). The selective interactions at surface by PS-brushed substrate that favors the preferential interactions with the PS component of the block copolymer enhance the parallel orientation of the lamellar microdomains to the film surface. This effect for weakly interacting PS-b-PMMA films leads to a gentle decrease of the transition temperature with increasing film thickness up to 50L0 (lamellar period). We will discuss this thickness dependence of transition temperatures for PS-b-PMMA films on preferential surfaces in terms of the temperature dependence of χ between two block components. |
| 저자 |
김은혜1, 류두열1, 안형주2, 조준한3
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| 소속 |
1연세대, 2연세대힉교 화공생명공학과, 3단국대 |
| 키워드 |
order-to-disorder transition; grazing incidence small angle x-ray scattering; block copolymer
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| E-Mail |
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