| 학회 |
한국재료학회 |
| 학술대회 |
2005년 가을 (11/10 ~ 11/11, 한양대학교) |
| 권호 |
11권 2호 |
| 발표분야 |
에너지환경재료 |
| 제목 |
Surface Texture 된 ZnO:Al 투명전도막의 제작 및 특성 |
| 초록 |
Low resistivity and highly transparent ZnO conducting films for thin film solar cell applications were fabricated at low temperature by rf magnetron sputter deposition. Al-doped ZnO films were deposited on Corning 2947 glass substrate at a substrate temperature of 200 ℃. Structural, electrical and optical properties of the ZnO:Al films were investigated in terms of the reparation conditions. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO:Al films by wet chemical etching is the etching time. The obtained films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The transmittance of the ZnO:Al films in the visible range was over 90.7 %. The lowest resistivity for the ZnO:Al films were about 5.7Ιx10-4 Ω•cm , Al content of 2.5 wt% with a substrate for about 800 nm in film thickness. |
| 저자 |
Sung Ju Tark1, Woo Young Kim1, Chang-Sik son2, In-Hoon Choi1, Donghwan Kim1
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| 소속 |
1Korea Univ., 2Silla Univ. |
| 키워드 |
TCO; Al-doped ZnO; solar cell; rf magnetron sputtering
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| E-Mail |
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