| 초록 |
Recently, nanoimprint lithography (NIL) has received great attention due to their potential applications in devices for electrical, optical, photonic and biological applications. Various nanomaterials including polymer, metal, ceramic can be fabricated using the NIL. However, the fabrication of metal oxide nanopatterns using conventional NIL is tedious since it includes time consuming deposition and lift-off process. In this study, ZnO thin films and nanostructures were fabricated by one-step UV NIL. The solution precursor comprised of zinc acetate, 2-methoxyethanol and ethanolamine as a solvent and stabilizer. Photosensitive 2-nitrobenzaldehyde was introduced into the solution precursors in order to form a cross-linked network structure during photochemical reaction. Structural and morphological properties of the ZnO thin films and nanostructures were investigated using XRD, AFM etc. |
