| 학회 |
한국화학공학회 |
| 학술대회 |
2002년 가을 (10/24 ~ 10/26, 서울대학교) |
| 권호 |
8권 2호, p.4802 |
| 발표분야 |
재료 |
| 제목 |
전자사이크로트론공명플라즈마 상온화학증착에 의해 제조된 Cu/C 박막특성 (특강) |
| 초록 |
Cu/C films were prepared at ambient temperature under Cu(hfac)2-Ar-H2 atmosphere in order to obtain metallized polymer by using ECR-MOCVD (Electron Cyclotron Resonance Metal Organic Chemical Vapor Deposition) coupled with DC bias system. DC bias selectively induces the positively charged copper ions and then makes them deposit on the polymer substrate. Structural analysis of the films by ECR showed that fine copper grains embedded in an amorphous polymer matrix with indistinctive interfacial layer. The electrical properties of the films were closely related to the process parameters such as microwave power, magnet current, H2/Ar mole ratio and periodic negative voltage. |
| 저자 |
이중기 |
| 소속 |
한국과학기술(연) |
| 키워드 |
ECR-MOCVD; DC bias; Polymer substrate; Cu/C films; sheet electric resistance
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| E-Mail |
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| 원문파일 |
초록 보기 |
