| 초록 |
There are a lots of silicon nanowire synthesis methods such as chemical vapor deposition, electrodeposition, etc. However, those are not proper to manipulate the diameter, length, and standing angle of nanowires, moreover, hard to product a large scale production. Recently, metal induced etching method had been introduced for silicon nanowire arrays which could be controlled by the concentration of HF and catalytic metal, etching time, kind of etchant, and temperature. Metal colloid is generally used nanotemplate since it could be introduced well ordered self assembled monolayer on the substrate. In this study, we will demonstrate the smallest silicon nanowire arrays using silver colloids and the new morphology of nanowires. |
