| 초록 |
Silsesquioxane has various applications in optical devices, membranes, interlayer dielectrics, photoresists and so on. Especially, methylsilsesquioxane is mainly used as matrix of nanoporous films for low dielectric layer. To realize nanoporous films without pore collapse, pore generating materials (porogen) should decompose above matrix condensation temperature(＞300 oC). This is one of key factors to select a porogen. In this study, we synthesized a new methylsilsesquioxane (MSSQ) precursor containing UV responsive pendant group and proposed an UV curing technique at room temperature using UV responsive matrix. Besides UV pre-treatment effect, we also made experiments to observe the possibilities of postcure and patterning by UV treatment. The structures of organosilicate films are characterized using FT-IR spectroscopy, Si-NMR, SEM and AES. Porosities of nanoporous films are calculated from refractive indices. Mechanical properties are measured using a nanoindenter. |
