| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 |
28권 1호, p.71 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Investigation of surface rearrangement of siloxane modified polyimide using NEXAFS |
| 초록 |
Polydimethylsiloxane modified polyimide has very good adhesion properties to SiO2, metals such as Al, Ni-Fe Alloy and etc. But it has some weak point of dewetting of photoresist for lithography because of too low surface energy due to siloxane migaration to surface. SDA of poly(dimethylsiloxane-co-diphenylsiloxane) modified polyimide could be wetted with photoresist. This was cause by rearrangement of siloxane. polydimethylsiloxane was arranged on surface in non polar atmosphere-air but polydiphenylsiloxane was rearranged on surface in polar atmosphere-photoresist. We investigated the polar-non polar surface rearrangement of poly(imide-siloxane) using x-ray photoelectron spectroscopy (XPS) and near edge x-ray absorption fine structure (NEXAFS) spectroscopy. Also dynamic contact angle data explained this phenomena. The initial advancing angles of polydimethylsiloxane modified polyimide and poly(dimethylsiloxane-co-diphenylsiloxane) modified polyimide were almost same but equilibrium advancing angle and receding angle of poly(dimethylsiloxane-co-diphenylsiloxane) modified polyimide were smaller than that of polydimethylsiloxane modified polyimide.
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| 저자 |
강진호;김영철;박찬언 |
| 소속 |
포항공과대 |
| 키워드 |
Siloxane; Polyimide; Surface rearrangement; NEXAFS; XPS
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| E-Mail |
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