화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2008년 봄 (05/09 ~ 05/10, 한양대학교(안산))
권호 12권 1호
발표분야 고분자
제목 Low-level Thermal Expansion Behavior of Random and Block Copolyimide/Silica Nanocomposite Thin Films
초록 A series of random and block copolyimide/silica nanocomposites has been prepared from an aromatic polyamic acid derived from 4,4’-oxydianiline (ODA), 1,4-phenylene diamine (PDA) and 1,2,4,5-benzentetracarboxylic dianhydride (PMDA) and a silica network. In this study, Tetraethyl Orthosilicate (TEOS) was used for generating inorganic polymer with the structure of Si-O-Si bond. Random and block copolyimide/silica nanocomposites were synthesized with the different silica contents (0, 6, 12, 18 wt%) and their cured films were all transparent.
저자 최승혁, 최익수, 조성민, 안재인, 한학수
소속 연세대
키워드 CTE; thermal expansion; copolyimide; nanocomposite; silica; random; block
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