| 초록 |
Successive ionic layer adsorption and reaction (SILAR) is a low temperature and solution based process that can deposit atomic layers at a time. It is advantageous due to layer-by-layer growth, which comprises excellent material utilization efficiency, good control over the deposition process along with film thickness and is specifically convenient for large area deposition. The SILAR results in pinhole-free and uniform deposits, since the basic building blocks are ions instead of atoms. In this study, we report on the formation of lead sulfide layers by the SILAR method on nanoporous titanium dioxide films and the preparation of Nb-doped TiO2 for application to PbS-based solar cells. |
