| 학회 | 한국고분자학회 |
| 학술대회 | 2006년 봄 (04/06 ~ 04/07, 일산킨텍스) |
| 권호 | 31권 1호 |
| 발표분야 | 고분자 합성 |
| 제목 | Study on the pyrolysis mechanism of a r-alkoxypropylsilyl group ; implications in the nanoporous silicate generation |
| 초록 | During the study on the nanoporous silicate thin films, we have discovered that r-alkoxysilyl moieties could be easily pyrolyzed to silicate. In order to investigate the mechanism, we have prepared several model conpounds and studied the pyrolysis by 1H-NMR, pyrolysis GC-MS and TGA. The study indicated that trialkoxy groups on silicon is required to promote easy pyrolysis and the r-alkoxysilyl group on the alkyl chain indeed promotes fragmentation of propyl group releasing cyclopropane. |
| 저자 | 권혜진, 문봉진 |
| 소속 | 서강대 |
| 키워드 | pyrolysis; nanoporous |
