학회 |
한국고분자학회 |
학술대회 |
2007년 봄 (04/12 ~ 04/13, 제주 ICC) |
권호 |
32권 1호 |
발표분야 |
고분자 합성 |
제목 |
Properties of Ultra-low Dielectric Materials Using Carbon Ash-free Porogens |
초록 |
We tried some reactive porogens based on organic cyclic-polyols such as β-cyclodextrin and glucose. But they left small amount of carbon residue after calcination. Because the carbon residue may act as a medium of leakage current by copper diffusion, ash-free porogen has to be developed. Therefore we developed ash-free reactive porogens based on organic noncyclic-polyols (pentaerythritol, dipentaerythritol, tripentaerythritol) and reducing sugars (D-mannitol, xylitol). We confirmed that new porogens were completely decomposed without leaving any carbon ash through TGA curves. BTESE copolymer (25%, k = 2.7) as a matrix and new reactive porogens were used to prepare nanoporous organosilicate films. When xylitol was used, nanoporous SOD showed lowest dielectric constant (k = 2.12) and highest mechanical properties (E = 9.1 GPa, H = 1.02 GPa) at the porosity of 26.25%. |
저자 |
박건우1, 이태훈1, 이용준1, 민성규2, 문봉진1, 윤도영3, 이희우1
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소속 |
1서강대, 2하이닉스 반도체, 3서울대 |
키워드 |
porogen; organic noncyclic polyols; reducing sugars; carbon residue; nanoporous organosilicate film
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E-Mail |
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