화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2007년 봄 (04/12 ~ 04/13, 제주 ICC)
권호 32권 1호
발표분야 고분자 합성
제목 Properties of Ultra-low Dielectric Materials Using Carbon Ash-free Porogens
초록 We tried some reactive porogens based on organic cyclic-polyols such as β-cyclodextrin and glucose. But they left small amount of carbon residue after calcination. Because the carbon residue may act as a medium of leakage current by copper diffusion, ash-free porogen has to be developed. Therefore we developed ash-free reactive porogens based on organic noncyclic-polyols (pentaerythritol, dipentaerythritol, tripentaerythritol) and reducing sugars (D-mannitol, xylitol). We confirmed that new porogens were completely decomposed without leaving any carbon ash through TGA curves. BTESE copolymer (25%, k = 2.7) as a matrix and new reactive porogens were used to prepare nanoporous organosilicate films. When xylitol was used, nanoporous SOD showed lowest dielectric constant (k = 2.12) and highest mechanical properties (E = 9.1 GPa, H = 1.02 GPa) at the porosity of 26.25%.
저자 박건우1, 이태훈1, 이용준1, 민성규2, 문봉진1, 윤도영3, 이희우1
소속 1서강대, 2하이닉스 반도체, 3서울대
키워드 porogen; organic noncyclic polyols; reducing sugars; carbon residue; nanoporous organosilicate film
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