| 초록 |
Self-assembled nanostructures of amphiphilic block copolymers have been used to fabricate nanoporous thin films by selective removal of one of the two block domains. These materials are promising in a wide range of applications such as templates for nano-structure fabrication, separation membranes, and sensors. In this study, we have successfully designed and synthesized photo-cleavable poly(styrene-block-ethylene oxide) which is functionalized with photo-cleavable linking unit, (2-nitrobenzyl group), in the middle of the block copolymer by atom transfer radical polymerization. The resulting block copolymer could be easily cleaved by UV-irradiation at 350 nm. Moreover, the cleavage could be efficiently achieved not only in solution phase but also in solid phase. The successful removal of PEO domains from a poly(styrene-block-ethylene oxide) thin film via UV-irradiation was verified by various analytical tools such as GPC, 1H-NMR, and TEM. |
