| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 가을 (10/07 ~ 10/08, 대구 EXCO) |
| 권호 |
35권 2호 |
| 발표분야 |
대학원생 구두발표 |
| 제목 |
Effiecient Surface Modification and Enhanced Adhesion to Substratesfrom Ketene based PS-r-PMMA Random Copolymers |
| 초록 |
One of the key issues for fabrication of block copolymer lithography is controlling the orientation of the microdomains in thin film. Most block copolymers have a preferential interaction one block with the substrate. The traditional method to neutralize the surface includes anchoring the end-functionalized PS-r-PMMA to substrate, generating cross-linked layer using BCB or azide groups. However, these methods have some disadvantages such as inefficient processing condition, complicated synthesis procedures, weak adhesion to the substrates, etc. In this work, we synthesized the new type of cross-linkable random copolymers based on the ketene groups using controlled-living polymerization. It was found that they can be efficiently modified the substrates and at the same time form the covalent bonding with substrate, thus overcome aforementioned limitations. |
| 저자 |
정현중1, 이수미2, 곽은애3, 문봉진2, Frank A. Leibfarth3, Luis M. Campos4, Craig J. Hawker5, 방준하6
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| 소속 |
1고려대, 2LCD division, 3Samsung electronics, 4서강대, 5Univ. of California, 6Santa Barbara |
| 키워드 |
Block copolymer; Neutral layer; Ketene based random copolymer
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| E-Mail |
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