| 초록 |
Along with the development of the electronic industry, the material field has been developing together. In particular, polymers take a huge part of the design change in the electronic products. Therefore, the main emphasis of this study was to better improve on the scratch resistance which was by adding Polyhedral Oligomeric Silsesquioxane(POSS) to Polystyrene that are commonly and widely used in home appliances. POSS(0.1%, 0.3%, 0.5%) containing Styrene monomer and Methacryl was added to 2L-Glass Reactor. It was confirmed that the Scratch Resistance was better than that of Conventional Polystyrene. Mechanical Properties and Elastic Modulus of Polystyrene with improved Scratch Resistance were also measured. |
