| 학회 |
한국공업화학회 |
| 학술대회 |
2010년 봄 (05/13 ~ 05/14, BEXCO(부산)) |
| 권호 |
14권 1호 |
| 발표분야 |
정밀화학 |
| 제목 |
Fabrication of N-doped TiO2 Thin Film Deposited by PECVD and Its Evaluation of Decomposition Activity of Acetaldehyde |
| 초록 |
In this study, N-doped TiO2 thin films were deposited on glass slides by PECVD process with titanium tetraisopropoxide(TTIP) as a precursor , argon as a carrier gas, nitorogen and oxygen gas as a reactive gas for 4hr at 400℃. The optimal condition of fabrication N-doped TiO2 thin films were investigated at various RF discharge power and flow rate. The chemical state and crystallity of N-doped TiO2 thin films were examined by ESCA and XRD. Photo-catalytic activity of N-doped TiO2 thin films were invstigated by decomposition of acetaldehyde with GC-MS. |
| 저자 |
박준1, 조명덕1, 박유정1, 송선정2, 임경택1, 조동련1
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| 소속 |
1전남대, 2BK21기능성나노신화학소재사업단 |
| 키워드 |
plasma; n-dope TiO2
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| E-Mail |
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