| 학회 | 한국화학공학회 |
| 학술대회 | 1998년 봄 (04/24 ~ 04/25, KOEX) |
| 권호 | 4권 1호, p.933 |
| 발표분야 | 재료 |
| 제목 | PECVD를 이용한 ZrO2 박막의 제조와 특성연구 |
| 초록 | Zirconia thin films were prepared by PEMO(metal organic)CVD with oxygen as a oxidant and Zr(TMHD)4 as a source. X-ray patterns and tape testing of zirconia filmsas a function of substrate temperature showed that it wasn’t obtained crystallinestructure below substrate of 350℃ and adhesive force of thin films to substrate was notgood at low temperatures. Thin films deposited had a (200) orientation of cubicstructure. The effect of RF power to affected strongly to deposition at 350℃ but wasindependent to at 500℃. The deposition of zirconia by pecvd was necessarily requiredoxygen. |
| 저자 | 김기동, 신동근, 조영아, 전진석, 최동수, 박종진 |
| 소속 | 한국가스공사 연구개발원 |
| 키워드 | zirconia; thin film; CVD |
| 원문파일 | 초록 보기 |
