| 학회 |
한국공업화학회 |
| 학술대회 |
2009년 가을 (10/15 ~ 10/16, 서울산업대학교 내 서울테크노파크) |
| 권호 |
13권 2호 |
| 발표분야 |
무기재료(포스터) |
| 제목 |
Analysis on TiO2 Thin Film Growth onto Particles in Rotating Plasma Chemical Vapor Deposition Process |
| 초록 |
TiO2 thin films were coated on glass beads and polypropylene beads by rotating plasma chemical vapor deposition process. Titanium tetraisopropoxide as a precursor was supplied into the plasma reactor by vaporization with N2 as a carrier gas. The N2 plasmas were generated by a 13.56 MHz RF generator with water cooled coil. Glass beads and polypropylene beads were located inside the cylindrical plasma reactor.As the precursor concentration increases, the concentrations of active radicals for film growth increase and the TiO2 thin films on the particles grow more quickly.As the rotation speed of the plasma reactor increases, the film thickness increases more quickly. |
| 저자 |
김교선, Hung Cuong Pham, 김동주
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| 소속 |
강원대 |
| 키워드 |
Plasma process; Rotating cylindrical plasma reactor; TiO2 thin film; Particle coating; TTIP
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| E-Mail |
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