화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2005년 봄 (04/14 ~ 04/15, 전경련회관)
권호 30권 1호, p.206
발표분야 복합재료
제목 Patterned Nano-dot Array Using Capillary Force Lithograpy and Block Copolymer Template
초록 For decades, block copolymer self-assembly and its use for nano-structure formation had been spot-lighted1. However, grain-like defects formed during self-assembly prohibited the block copolymer patterning from being used in practical industry. Therefore, many researchers have been longing for the method to reduce these defects and confined geometry was proposed as the efficient way for that.2 In this work, we fabricated patterned nano-dots array using capillary force lithography (CFL) and block copolymer template. A well-defined line and circular ring patterns fabricated by CFL had been used as a confining geometry to obtain block copolymer patterns at desired area and improve packing quality of PS-b-PMMA self-assembled thin film. To reduce the feature size, polymeric pre-patterns using CFL were modified by reactive ion etching (RIE). Furthermore, to enhance the solvent and heat resistance, they were cross-linked with ozone treatment. On this polymeric confining geometries, the block copolymer was guided as well-ordered hexagonal array by the confining effect of side wall. Then, nano-dot formation method using Ti masking process was employed to create the well-ordered functional nano-dot array. According to our experimental results, fine cross-linked polymeric guide-lines formed and modified by CFL and RIE successfully improved the ordering of block copolymer and well-aligned Co/Pd magnetic nano-dots were fabricated with the diameter of ca. 30nm.

References

1. (a) Thurn-Albrecht, T.; Schotter, J.; Kastle, A.; Emley, N.; Shibauchi, T.; Krusin-Elbaum, L.; Guarini, K.; Block, C. T.; Tuominen, M. T.; Russell, T. P., Science 2000, 290, 2126 (b) Park, M.; Harrison, C. K.; Chaikin, P. M.; Reister, R. A.; Adamson, D. H. Science 1997, 276, 1407 (c) Mansky, P.; Harrison, C. K.; Chaikin, P. M.; Register, R. A.; Yao, N., Appl. Phys. Lett. 1996, 68, 2586

2. (a) Cheng, J. Y.; Ross, C. A.; Thomas, E. L.; Smith, H. I.; Vancso, G. J. Appl. Phys. Lett. 2002, 81,3657 (b) Cheng, J. Y.; Ross, C. A.; Thomas, E. L.; Smith, H. I.; Vancso, G. J. Adv. Mater. 2003, 15, 1599 (c) Sundrani, D; Darling, S. B.; Sibener, S. J. Nano Lett. 2004, 4, 273
저자 장세규, 양승만
소속 한국과학기술원
키워드 nano-dot; block copolymer; self-assembly; capillary force lithography; confined geometry
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