| 학회 |
한국공업화학회 |
| 학술대회 |
2005년 봄 (05/13 ~ 05/14, 충남대학교) |
| 권호 |
9권 1호 |
| 발표분야 |
나노 |
| 제목 |
Residual Layer 제어를 위한 SiC계 세라믹 패터닝 방법과 Reactive Ion Etching |
| 초록 |
Microelectromechanical systems (MEMS) is a rapidly growing technology with a broad range of commercial applications and a diverse collection of evolving MEMS sensors and actuators. In this study, nano-scale siliconcarbide-based ceramic patterns on Si substrates were fabricated by capillary force lithography (CFL) technique. And, in order to control the thickness of residual layers which is considerably one of main problems in the imprinting processes. The etching kinetics of the various polymeric and ceramic patterns is comparatively studied to remove effectively the residual layer by Reactive Ion Etching. |
| 저자 |
박준홍, 홍난영, 김동표
|
| 소속 |
충남대 |
| 키워드 |
Residual Layer; Reactive Ion Etching; 패터닝 방법
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| E-Mail |
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